OPT-S3000 Ellipsometers
STANDARD FEATURES
  • Excellent accuracy and repetition
  • Widest variable angle (20°-90°)
    • Adjustable stage in step 5°
  • Standard wavelenght 635 nm laser
  • A second laser for easy alignment and accuracy
  • Measurement speed is less than 1 sec.
  • Large sample stage
  • User friendly software and material library 
    • Hundreds of materials information in material library
TECHNICAL SPECIFICATIONS
  • Standard wavelength     635 nm
  • Optional wavelength    470 nm, 532 nm, 785 nm, 1064 nm, 1310 nm
  • Thickness range of transparent films    0 - 6000 nm
  • Thickness range of absorptive films    0 - 6000 nm
  • Accuracy of refractive index measurement   ± 0.001 
  • Accuracy of film thickness measurement ± 0.1nm for SiO2 standard sample
  • Stability with compensator    ± 0.01° in Delta
  • Measurement time   less than 1 sec
  • Sample alignment    Second laser alignment with correction unit
  • Sample stage adjustments   tilt and height
  • Range of angle   20 - 90°
  • Angle steps    5°± 0.01°
OPTIONS

Combined Optiical Profiler

Wavelenghts 470nm,  532 nm,  635 nm, 785 nm, 1064 nm, 1310 nm

Micro Spotsize

Wafer Mapping

Automated Angle of Incidence 20-90°

Motorized XY stage

Liquid Cell

CCD image camera

Heater